Despite its advantages, EUV lithography faces several significant challenges:
High Cost: The equipment and materials required for EUV lithography are extremely expensive. Light Source Power: Generating a sufficiently powerful and stable EUV light source is technically challenging. Mask Defects: Any defects in the mask can be transferred to the wafer, impacting yield and performance. Photoresist Sensitivity: Developing photoresists that are sensitive enough to EUV light while maintaining high resolution is difficult.
