How Does EUV Compare to Other Lithography Techniques?
Compared to traditional photolithography, which uses deep ultraviolet light at wavelengths around 193 nanometers, EUV offers significantly higher resolution. Electron beam lithography (EBL) and nanoimprint lithography (NIL) are other techniques used to achieve nanoscale features, but they come with their own sets of advantages and limitations. EBL, for instance, is highly precise but slow and costly, while NIL can be efficient but may struggle with uniformity over large areas.
