The primary advantage of EUV lithography is its ability to produce extremely small features with high precision. This is crucial for the continued scaling of Moore's Law, which predicts the doubling of transistors on a microchip approximately every two years. Other benefits include:
Higher Resolution: The shorter wavelength of EUV light allows for finer feature sizes compared to traditional photolithography. Reduced Complexity: EUV requires fewer processing steps, which can lower manufacturing costs. Enhanced Performance: Smaller features enable faster, more energy-efficient chips.
