How Does Gate Oxide Leakage Impact Future Technologies?
Gate oxide leakage poses significant challenges for future technology nodes and Moore's Law. As transistors continue to shrink, traditional silicon-based technologies may reach their physical and practical limits. Alternative approaches such as FinFETs, nanowires, and carbon nanotubes are being explored to overcome these limitations. Additionally, the development of new materials and improved fabrication techniques will be essential to address the challenges posed by gate oxide leakage.
