What Challenges Exist in Working with Hafnium Oxide?
Despite its promising properties, there are challenges associated with the use of hafnium oxide in nanotechnology. One major challenge is the integration of HfO2 with existing materials and processes in semiconductor manufacturing. Additionally, controlling the stoichiometry and uniformity of HfO2 films during deposition is critical for achieving consistent device performance. Researchers are continually working to overcome these challenges through advanced fabrication techniques and material engineering.
