How is Hafnium Oxide Used in Semiconductor Technology?
In semiconductor technology, HfO2 is primarily used as a high-k dielectric material in MOSFET (Metal-Oxide-Semiconductor Field-Effect Transistor) gate stacks. Traditional silicon dioxide gate dielectrics are being replaced by high-k materials like hafnium oxide to reduce gate leakage current and improve device performance. The integration of HfO2 in MOSFETs helps in scaling down the transistor dimensions while maintaining excellent electrical characteristics.
