What are the Future Directions in Gate Work Function Tuning?
Future research in gate work function tuning is focusing on the development of new materials and techniques to achieve more precise control over the work function. This includes exploring two-dimensional materials like MoS2 and h-BN, as well as advanced deposition techniques such as atomic layer deposition (ALD) for better film uniformity. Additionally, innovative approaches like work function engineering through strain or electric field modulation are being investigated to enhance device performance further.
