What Materials are Used for Gate Work Function Tuning?
A variety of materials can be used to achieve the desired gate work function. Traditional polysilicon gates are being replaced by metal gates such as titanium nitride (TiN), tantalum nitride (TaN), and tungsten (W). These materials offer better control over work function and are more compatible with high-k dielectrics that are used to reduce gate leakage. Additionally, novel materials like graphene and transition metal dichalcogenides (TMDs) are being explored for their exceptional electronic properties.
