Why is Gate Work Function Tuning Important in Nanotechnology?
As transistors shrink to the nanoscale, traditional bulk silicon approaches face limitations due to increased leakage currents and variability in threshold voltage. Precise tuning of the gate work function is essential to maintain control over the electrical characteristics of these devices. This is particularly important for applications in CMOS technology, where both NMOS and PMOS transistors must be optimized for low power consumption and high performance.
