What are the Challenges in Gate Work Function Tuning?
Several challenges need to be addressed in gate work function tuning. One major challenge is the compatibility of new gate materials with existing fabrication processes. Additionally, maintaining uniformity and stability of the work function across the wafer is critical for device performance. The integration of high-k dielectrics also poses challenges, as they can interact with the gate material and alter its work function. Furthermore, scaling down to the nanoscale introduces variability and defects that must be carefully managed.
