What Techniques are Used to Improve Linewidth Control?
Various techniques are employed to improve linewidth control:
Extreme Ultraviolet (EUV) Lithography: EUV lithography uses shorter wavelengths of light to achieve smaller feature sizes, improving linewidth control. Self-Assembly: Techniques such as block copolymer self-assembly can create well-defined nanostructures with precise linewidths. Electron-Beam Lithography: E-beam lithography offers high-resolution patterning, making it suitable for creating small linewidths.
