There are several types of photoresist materials, each suited for different applications:
Positive Photoresist: Becomes soluble when exposed to light, allowing the exposed areas to be developed away. Negative Photoresist: Becomes insoluble when exposed to light, enabling the unexposed areas to be removed during development. Electron Beam Resists: Used in electron beam lithography, where high-energy electrons create the pattern. Extreme Ultraviolet (EUV) Resists: Utilized in EUV lithography, which uses extremely short wavelengths for higher resolution patterning.
