What Are the Challenges in Using Photoresist Materials?
Several challenges exist in the use of photoresist materials for nanotechnology applications:
Resolution Limits: Achieving the desired resolution for nano-scale features can be difficult due to the diffraction limits of light. Line Edge Roughness (LER): The edges of the patterned features can be rough, affecting the performance of the nano-device. Material Compatibility: Ensuring that the photoresist materials are compatible with the substrate and other process chemicals. Environmental Stability: Maintaining the stability of photoresist materials under various environmental conditions, such as temperature and humidity.
