What Innovations are Emerging in Photoresist Materials?
Recent advancements in photoresist materials aim to address the challenges mentioned above:
Hybrid Resists: Combining organic and inorganic components to enhance resolution and stability. Bio-Resists: Using biological materials to create eco-friendly and high-resolution patterning solutions. Nanocomposite Resists: Incorporating nanoparticles to improve the mechanical properties and resolution of the photoresist. Self-Assembly Techniques: Utilizing self-assembling molecules to create highly ordered nano-patterns.
