What are the recent developments in Chemical Vapor Deposition (CVD)?
CVD techniques have advanced with the development of plasma-enhanced CVD (PECVD) and atomic layer CVD which provide better control over film thickness and composition. These improvements are particularly important for the deposition of high-quality graphene and other 2D materials. Additionally, advancements in precursor chemistry have enabled the deposition of complex multi-component materials, expanding the range of possible applications.
