What advancements have been made in Top-down Lithography?
Top-down lithography has seen significant improvements in resolution and precision. Extreme ultraviolet (EUV) lithography has emerged as a game-changer, enabling feature sizes below 10 nanometers. Additionally, direct-write electron beam lithography offers unparalleled precision, though at a higher cost and slower throughput. These advancements allow for the creation of more complex and smaller structures, critical for next-generation electronics and photonic devices.
