improved fabrication techniques

How has Atomic Layer Deposition (ALD) improved?

ALD has seen enhancements in both the variety of materials that can be deposited and the precision of layer control. Innovations in precursor design have enabled the deposition of new materials with desirable properties, such as high-k dielectrics for semiconductor applications. Additionally, the development of spatial ALD has significantly increased the throughput, making the technique more viable for industrial-scale applications.

Frequently asked queries:

Partnered Content Networks

Relevant Topics