What Are the Challenges in Etching at the Nanoscale?
Etching at the nanoscale presents several challenges, such as:
Feature Size Control: Achieving precise control over feature sizes and shapes requires meticulous optimization of etching parameters. Aspect Ratio Constraints: High aspect ratio structures can suffer from issues like aspect ratio-dependent etching (ARDE) and footing effect. Material Compatibility: Different materials may require different etching chemistries, complicating multi-layered structures. Surface Roughness: Minimizing surface roughness is crucial for applications like optical devices and microfluidics.
