What are the Challenges in Creating High Density Patterns?
Despite the advancements in techniques, there are several challenges associated with creating high-density patterns.
Resolution Limits: As the demand for smaller and denser patterns increases, traditional methods like optical lithography face resolution limits due to the wavelength of light used. Alignment Issues: Ensuring precise alignment of patterns over large areas is critical but challenging, especially when dealing with features at the nanoscale. Material Compatibility: The materials used for patterning must be compatible with the substrate and the intended application, which can be difficult to achieve. Cost: Advanced techniques such as EUVL require expensive equipment and materials, making them less accessible for smaller research facilities or companies.
