Lithography: This is one of the most commonly used methods, especially in the semiconductor industry. It involves using light, electrons, or ions to transfer a pattern onto a substrate. Advanced techniques like Extreme Ultraviolet Lithography (EUVL) allow for the creation of patterns with features smaller than 10 nanometers. Self-assembly: This method leverages the natural tendency of molecules to organize themselves into structured patterns. By carefully designing the molecules, researchers can create highly regular and dense patterns without the need for complex machinery. Nanoimprinting: This technique involves pressing a mold with nanoscale features into a substrate to transfer the pattern. It is a cost-effective method for creating high-density patterns over large areas.
