What are the Challenges in Creating High Resolution Patterns?
Despite the advancements in techniques, creating high resolution patterns comes with several challenges:
Resolution Limits: The diffraction limit in photolithography and the proximity effect in EBL can restrict the minimum feature size. Alignment and Overlay: Achieving precise alignment between multiple layers of patterns is crucial for device functionality. Material Compatibility: Ensuring that the materials used for patterning are compatible with the underlying substrate and subsequent processing steps. Cost: High resolution patterning techniques can be expensive and time-consuming, posing challenges for large-scale manufacturing.
