What Techniques are Used to Create High Resolution Patterns?
Several advanced techniques are employed to create high resolution patterns, including:
Electron Beam Lithography (EBL): Utilizes a focused beam of electrons to draw custom patterns on a substrate covered with an electron-sensitive resist. Photolithography: Uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate. Nanoimprint Lithography (NIL): A high-throughput, low-cost technique that involves mechanically deforming a resist to create patterns. Scanning Probe Lithography (SPL): Employs scanning probe techniques, such as atomic force microscopy, to manipulate materials at the nanoscale.
