How is T-NIL Different from Other Lithography Techniques?
T-NIL is distinct from other lithography techniques like photolithography, electron beam lithography, and soft lithography. Photolithography uses light to transfer patterns and is widely used in semiconductor manufacturing, but it struggles with resolution below 100 nm without expensive equipment. Electron beam lithography offers high resolution but is slow and costly. Soft lithography, using elastomeric molds, is suitable for flexible substrates but lacks the resolution of T-NIL.
