thermal nanoimprint lithography

What are the Challenges of T-NIL?

Despite its advantages, T-NIL faces several challenges:
Mold Fabrication: Creating molds with nanoscale features can be complex and costly.
Thermal Expansion: Differential thermal expansion between the mold and resist can lead to pattern distortion.
Adhesion Issues: Sticking of the resist to the mold can cause defects in the imprinted pattern.
Material Limitations: The choice of thermoplastics is limited to those that can withstand repeated heating and cooling cycles.

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