Achieving multi-element capability involves several advanced techniques:
1. Chemical Vapor Deposition (CVD): This technique allows for the deposition of thin films of various elements onto a substrate. 2. Atomic Layer Deposition (ALD): ALD is used for precise control over the composition and thickness of films at the atomic scale. 3. Sol-Gel Processing: This method involves the transition of a system from a liquid 'sol' into a solid 'gel' phase, enabling the incorporation of various elements. 4. Electrochemical Deposition: This technique involves the reduction of metal ions from a solution to form a solid metal coating.
