Electron Beam Lithography (EBL) EBL is a top-down technique that uses a focused beam of electrons to create extremely fine patterns on a surface. This method is essential for creating integrated circuits and quantum dots.
Atomic Layer Deposition (ALD) ALD is a bottom-up technique that allows for the precise deposition of thin films, often one atomic layer at a time. It is widely used in the semiconductor industry for creating high-quality, uniform films.
Scanning Tunneling Microscopy (STM) STM is a technique that uses a sharp tip to scan atoms on a surface, providing images at the atomic level. This method can also manipulate individual atoms, making it crucial for nanofabrication.
Self-Assembly This bottom-up approach involves the spontaneous organization of molecules into structured arrangements. It is a key technique for creating nanostructured materials and devices with complex architectures.
