Lithography is a cornerstone technique in nanoscale fabrication. It involves transferring a pattern onto a substrate using a focused beam of light, electrons, or ions. Photolithography uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate. Electron-beam lithography (EBL), on the other hand, uses a focused beam of electrons and can achieve finer resolution, making it suitable for creating extremely small features.
