The process of UV-NIL typically involves several crucial steps:
Mold Preparation: A mold with the desired nanoscale patterns is fabricated from materials like silicon or quartz. Resist Coating: A substrate is coated with a UV-curable resist material. Imprinting: The mold is pressed onto the resist-coated substrate, transferring the pattern. UV Exposure: Ultraviolet light is used to cure and harden the resist material. Mold Release: The mold is carefully removed, leaving the patterned resist on the substrate. Etching (Optional): Additional etching processes may be used to transfer the pattern into the substrate material.
