What are the Challenges in UV Nanoimprint Lithography?
Despite its advantages, UV-NIL faces several challenges:
Mold Fabrication: Creating high-quality molds with nanoscale features can be complex and expensive. Defect Control: Ensuring defect-free pattern transfer requires precise control over the imprinting process. Material Compatibility: Finding suitable resist materials that are both UV-curable and compatible with the substrate can be challenging. Alignment: Accurate alignment between the mold and substrate is crucial for multi-layer patterning.
