UV Nanoimprint Lithography (UV-NIL) is an advanced patterning technique used in nanotechnology to create nanoscale structures on a substrate. This method involves using a mold to imprint patterns onto a thin layer of UV-curable resist material, which is then solidified by exposure to ultraviolet light. The key advantage of UV-NIL is its ability to achieve high-resolution patterns with low cost and high throughput, making it suitable for various applications including semiconductors, photonic devices, and bio-sensors.
