Resists function by undergoing a chemical transformation upon exposure to a particular type of radiation. This transformation alters the solubility of the resist in a developer solution, enabling selective removal of either the exposed or unexposed regions. There are two main types of resists:
Positive Resists: Become more soluble in the developer after exposure, thereby allowing the exposed areas to be washed away. Negative Resists: Become less soluble in the developer after exposure, so the unexposed areas are removed.
