FIB offers several advantages, making it an essential tool in nanotechnology research and industry:
1. Precision: It allows for extremely precise material removal or deposition, achieving resolutions down to a few nanometers. 2. Versatility: FIB systems can switch between milling, deposition, and imaging modes, making them multifunctional. 3. Speed: Compared to other lithography techniques, FIB can quickly create complex nanostructures. 4. Direct Write Capability: It can directly write patterns without the need for masks or resists, simplifying the fabrication process.
