Thin films are typically fabricated using techniques like physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD methods include sputtering and evaporation, where material is vaporized and then deposited onto a substrate. CVD involves chemical reactions between gaseous precursors to form a solid film on the substrate. Atomic layer deposition (ALD) is another technique that allows for the precise control of film thickness and composition at the atomic level.
