Several techniques are crucial for nanomanufacturing, each with its own set of advantages and challenges:
Photolithography: Widely used in the semiconductor industry, this technique employs light to transfer a geometric pattern from a photomask to a substrate. Electron Beam Lithography (EBL): Uses a focused beam of electrons to create custom nanoscale patterns. It offers high resolution but is relatively slow and costly. Nanoimprint Lithography (NIL): Involves pressing a nanopatterned stamp into a polymer film to create nanoscale features. It is cost-effective and scalable. Atomic Layer Deposition (ALD): A technique used for depositing thin films of material with atomic layer precision. It is particularly useful for coating irregular surfaces. Self-Assembly: Leveraging the natural tendency of molecules to organize into ordered structures, this method is promising for creating complex nanostructures.
