Contamination-Free Environment: At such low pressures, the likelihood of contamination from gas molecules is minimized, which is essential for experiments and processes that require ultra-pure conditions. Precision and Accuracy: Many nanotechnology processes, such as Atomic Layer Deposition (ALD) and Scanning Tunneling Microscopy (STM), require precise control over atomic and molecular interactions. XUHV ensures that these interactions are not influenced by extraneous factors. Surface Analysis: Techniques like X-Ray Photoelectron Spectroscopy (XPS) and Low Energy Electron Diffraction (LEED) benefit from XUHV as it allows for the analysis of surfaces without interference from adsorbed gases.
