In the realm of nanotechnology, the precision and cleanliness of surfaces are paramount. UHV conditions are crucial for processes like atomic layer deposition (ALD), scanning tunneling microscopy (STM), and molecular beam epitaxy (MBE). These advanced techniques allow for the manipulation and observation of materials at the atomic scale. Contaminants, even in minuscule amounts, can drastically alter the properties and behavior of nanoscale materials and devices.
