PLD is particularly significant in nanotechnology for several reasons:
Precision: PLD allows for the deposition of layers with atomic-scale precision. Versatility: It can be used to deposit a wide range of materials, including oxides, nitrides, and complex compounds. Stoichiometry: The technique often preserves the stoichiometry of the target material, which is crucial for creating functional nanostructures. Control: Parameters such as laser energy, pulse duration, and substrate temperature can be finely tuned to achieve desired film properties.
