What role does innovation play in overcoming these challenges?
Innovation is crucial in addressing the challenges of nanofabrication. Advances in nanolithography techniques, such as extreme ultraviolet lithography (EUVL) and nanoimprint lithography (NIL), aim to improve resolution and reduce costs. In the realm of bottom-up methods, research into novel materials and self-assembly mechanisms holds promise for achieving better control and scalability. Additionally, the development of hybrid techniques that combine top-down and bottom-up approaches could offer new pathways for efficient and cost-effective nanofabrication.
