Defects are a major concern in nanofabrication because they can drastically affect the performance and reliability of nanodevices. Even minor defects at the nanoscale can lead to device failure or significant performance degradation. Techniques such as atomic force microscopy (AFM) and scanning electron microscopy (SEM) are often employed to detect and characterize these defects, but implementing these techniques adds to the complexity and cost of the fabrication process.
