What Role Does Doping Play in Channel Engineering?
Doping is the process of intentionally introducing impurities into the semiconductor material to modify its electrical properties. In channel engineering, precise control over the type and concentration of dopants is crucial. Proper doping can enhance carrier mobility, reduce [threshold voltage](href) variability, and improve overall device performance. Advanced doping techniques, such as ion implantation and molecular beam epitaxy, are often used to achieve the desired results.
