High-κ dielectrics are materials with a high dielectric constant (κ), which are used to replace traditional silicon dioxide in the gate dielectric of transistors. The primary benefit of high-κ dielectrics is their ability to reduce [gate leakage](href), which is a significant issue at nanoscale dimensions. By using high-κ materials, manufacturers can create thinner gate dielectrics without increasing leakage currents, thereby improving the overall performance of transistors.
