Photomasks are categorized based on their complexity and use. Some common types include:
Binary Masks: The simplest form with a clear and opaque area to define the pattern. Phase-Shift Masks: These enhance the resolution of lithography by shifting the phase of light, improving pattern fidelity. Attenuated Phase Shift Masks: A combination of binary and phase-shift masks, providing both amplitude and phase control. Alternating Phase Shift Masks: Improve resolution further by alternating light phases across different pattern areas.
