What Advances are Being Made in Photomask Technology?
To overcome these challenges, several advances are being pursued:
Extreme Ultraviolet Lithography (EUVL): Uses shorter wavelengths to achieve finer patterns, reducing the reliance on complex mask designs. Multiple Patterning Techniques: Techniques like self-aligned double patterning (SADP) and self-aligned quadruple patterning (SAQP) enhance resolution without needing new masks for each layer. Maskless Lithography: Using electron beams or other direct writing methods to eliminate the need for masks in some applications. Artificial Intelligence: Employing AI for better defect detection and correction during the mask fabrication process.
