There are several types of NIL, each with unique characteristics and applications:
Thermal Nanoimprint Lithography (T-NIL): This involves heating the resist above its glass transition temperature to make it pliable before imprinting and then cooling to solidify the pattern. UV Nanoimprint Lithography (UV-NIL): This uses a UV-sensitive resist that is cured by exposure to UV light during imprinting. Reverse NIL: A technique where the resist is first applied to the mold and then transferred to the substrate.
