What are the Challenges in Nanoimprint Lithography?
Despite its advantages, NIL faces several challenges:
Durability of Molds: The mold must withstand repeated use without degrading, which can be challenging for nanoscale features. Alignment Issues: Ensuring precise alignment between the mold and substrate is critical for successful patterning. Defect Control: Even minor defects in the mold or resist can result in significant errors in the final pattern.
