What are the Advantages of Nanoimprint Lithography?
NIL offers several advantages over traditional lithographic techniques:
High Resolution: NIL can achieve feature sizes of less than 10 nm, making it ideal for advanced nanofabrication. Cost-Effectiveness: Unlike conventional lithography, NIL does not require expensive photomasks or complex optics. High Throughput: NIL can produce large areas of nanoscale patterns quickly, making it suitable for industrial applications.
