What are the Techniques Used in Nanoscale Patterning?
Several techniques are used for nanoscale patterning, each with its own advantages and limitations:
Photolithography: Uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate. Electron Beam Lithography (EBL): Employs a focused beam of electrons to create extremely fine patterns. Nanoimprint Lithography (NIL): Uses a mold to physically imprint a pattern onto a substrate. Self-Assembly: Relies on the natural tendency of molecules to organize into predefined structures. Dip-Pen Nanolithography (DPN): Utilizes an atomic force microscope (AFM) tip to directly deposit material onto a substrate.
