What are the Recent Advances in CMP Slurry Formulations?
Recent advances in CMP slurry formulations focus on enhancing performance and reducing defects. Innovations include:
1. Nanoparticle-based Slurries: Utilizing nanoparticles instead of traditional micron-sized abrasives for finer control and better surface finish. 2. Hybrid Abrasives: Combining different types of abrasive particles to optimize both mechanical and chemical actions. 3. Functionalized Particles: Coating abrasive particles with functional groups to improve selectivity and reduce defects. 4. Adaptive Formulations: Developing slurries that can adapt their chemical and mechanical properties in response to real-time feedback during the CMP process.
