What are the Common Techniques for Material Ejection?
Several techniques are employed for material ejection in nanotechnology, each with its unique advantages and limitations:
Focused Ion Beam (FIB): Utilizes a focused beam of ions to sputter material from a surface, providing high precision and control. Laser Ablation: Employs laser pulses to vaporize material, allowing for rapid and localized removal. Electron Beam Lithography (EBL): Uses a focused beam of electrons to define patterns by material ejection or modification. Atomic Force Microscopy (AFM) Nanomachining: Utilizes a sharp tip to mechanically remove material at the nanoscale.
