Despite its advantages, EUVL faces several challenges. One major issue is the generation of EUV light, which requires high-energy sources such as laser-produced plasma or synchrotrons. These sources are not only expensive but also complex to maintain. Additionally, the mirrors used in EUVL must be extremely smooth and precisely aligned, which can be technically demanding and costly. The photoresist materials must also be highly sensitive to EUV light while maintaining high resolution and low line-edge roughness.
